This type of high-temperature and high-pressure device is mainly used for high-temperature and high-pressure experimental conditions of samples, suitable for optical, XRD, and magnetic measurements in different optical path environments and line station matching. It can be equipped with an in-situ gas pressurization interface and is suitable for multiple DACs.

The resistance wire heating ring is suitable for a temperature range of room temperature to 1500K (1500K is the self heating temperature controlled by the temperature controller for the heating ring); The sample is usually encapsulated between two diamond anvil cells, so the actual temperature of the sample can only be calibrated through internal sample calibration or spectral calibration. Another thermocouple can be attached to the conical surface of one side of the stationary diamond anvil cell to indirectly approximate the temperature of the monitored sample. For resistance wire heating conditions above 700K, it is recommended to add a vacuum/atmosphere protection chamber to avoid high-temperature corrosion damage to the main material of the press and anvil material.

The material of the external vacuum protection chamber of this type of high-temperature and high-pressure device is 316 stainless steel/aluminum, with a leakage rate of better than 10-10Pam3/s. Double sided and four sided observation windows can be customized according to the beam requirements, and the installation method can be compatible and fixed with the displacement system.

01A型--水冷和电气接口在底部装配的高温恒温器设计图：

01B型--水冷和电气接口在侧面装配的高温恒温器设计图：

02C型--长方形立式装配高温恒温器设计图：

常用的加热压机及加热环设计图纸（高温压机装配使用可参考文件“电阻丝型内加热型BX90装配说明”）：

高温压机常规使用配置单如下表所示。